Metal Sputtering Targets bonding

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gapa520
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Metal Sputtering Targets bonding

Post by gapa520 » Thu Feb 14, 2019 10:53 pm

Chromium sputtering target, high purity, monolithic, rotatable, disc, HIP, planar, cathodic ARC, PVD coating, thin film deposition, magnetron Cr sputtering targets manufacturer and supplier
CHROMIUM SPUTTERING TARGET
Haohai offers high density, hot rolled Chromium sputtering targets of electrolytic Chromium refined to a purity up to 99.99% with a low content of oxygen and other gaseous impurities.
Chromium and Chromium Nitride (CrN) made from Haohai's Chromium sputtering targets is an excellent function and decorative coating that provides lubricity and superior wear and corrosion resistance. It has a very low residual stress, which provides for the best adhesion and ductility of any of the PVD coatings even as a bonding layer in DLC coatings (Diamond Like Carbon). It can applicate in automotive parts, molds and dies, pump parts, shafts, dry deep drawing and works especially well when used against copper.

Decorative chromium coatings are applied using the magnetron sputtering method.
Wear resistant and adhesive layers can also be produced using the arc evaporation method.

Haohai Chromium sputtering targets include Chromium rotary sputtering targets, Chromium planar sputtering targets and Chromium cathodic targets.
Chromium Rotary (Rotatable, Cylindrical) Sputtering Target
Manufacturing Range
OD (mm)ID (mm)Length (mm)Custom Made
50 - 30030 - 280100 - 4000
Specification
CompositionCr
Purity2N5 (99.5%), 2N8 (99.8%), 3N (99.9%), 3N5 (99.95%), 4N (99.99%)
Density7.19 g/cm3
Grain Sizes< 100 micron or on request
Fabrication ProcessesVacuum Melting, HIP, Plasma Spraying, Machining, Bonding
ShapeStraight, Dog bone
End TypesSCI, SRF, DSF, RFF, WFF, VA, GPI Ends Fixation, Spiral Groove,
Custom Made for SS Backing Tube
SurfaceRa 1.6 micron
Other Specification
✦ Vapor degreased and demagnetized after final machining.
✦ ID to be HONED and OD GROUND after raw tube is produced to ensure ID to OD concentricity meets drawing requirements.
✦ High vacuum tight, leak rate at any location not to exceed 1 x 10-8 STD CC/SEC.
✦ Sealed in plastic, wrapped in foam to protect, and ends capped to protect seal surfaces.
Normal Sizes
Chromium Rotary
Sputtering TargetNormal SizesSS Backing Tubes
55mm ID x 70mm OD x 1334mm Long
80mm ID x 100mm OD x Long
125mm ID x 153mm OD x 576mm Long
125mm ID x 153mm OD x 800mm Long
125mm ID x 153mm OD x 895mm Long
125mm ID x 155mm OD x 895mm Long
125mm ID x 153mm OD x 1172mm Long
125mm ID x 153mm OD x 1676mm Long
125mm ID x 153mm OD x 1940mm Long
125mm ID x 153mm OD x 1994mm Long
125mm ID x 153mm OD x 2420mm Long
125mm ID x 153mm OD x 3191mm Long
125mm ID x 153mm OD x 3852mm Long
125mm ID x 153mm OD x Long
125mm ID x 180mm OD x 624mm Long
194mm ID x 219mm OD x 2301mm Long 80mm ID x 88.0mm OD x Long
125mm ID x 133.0mm OD x 1940.0mm Long
125mm ID x 132.5mm OD x 3200.4mm Long
125mm ID x 132.5mm OD x Long

Chromium Planar (rectangle, circular) Sputtering Target

Manufacturing Range
RectangleLength (mm)Width (mm)Thickness (mm)Custom Made
10 - 200010 - 12001.0 - 50.8
CircularDiameter (mm)
Thickness (mm)
10 - 1000
1.0 - 100
Specification
CompositionCr
Purity2N5 (99.5%), 2N8 (99.8%), 3N (99.9%), 3.5N (99.95%), 4N (99.99%)
Density7.19 g/cm3
Grain Sizes< 100 micron or on request
Fabrication ProcessesVacuum Melting, HIP, Plasma Spraying, Machining, Bonding
ShapePlate, Disc, Step, Custom Made
TypesMonolithic, Multi-Segmented Target, Bonding
SurfaceRa 1.6 micron
Other Specifications
Flatness, clean surface, polished, free of crack, oil, dot, etc.
We monitor and control from the initial step - choose and mix powder, and then under the follow up process of shaping such as HIP, we make sure that our targets get the specific guaranteed density, purity and homogeneous microstructure, to provide our customer the best conditions to coat excellent thin films.
Chromium Arc Cathodes
We supply rotary and planar arc cathodes as well as rotary and planar sputtering targets.
For our Chromium Sputtering Target and Arc Cathodes
Tolerance
Acc. to drawings or on request.

Impurities Content [ppm]
Purity [%]
99.9999.9599.899.5
Metallic Impurities [ppm]Fe502008001000
Si20100500700
Other30100400500
Non-Metallic Impurities [ppm]O10020010001200
N20100200200
C20100300300
Guaranteed Density [g/cm3]7.157.157.127.12
Grain Size [μm]100100100100
Thermal Conductivity [W/(m.K)]max.260max.250max.150max.100
Coefficient of Thermal Expansion [1/K]7.10-67.10-67.10-67.10-6
Application
✦ Large Area Glass Coating (Low-E, Automotive)
✦ Display Inducstry
✦ Wear Resistant Coating
✦ Decorative Coating
✦ Optical Industry
✦ Solar & Photovoltaic Industry
✦ Magnetic Data Storage

Haohai Metal (Haohai Titanium), equipped with professional factory, is one of the leading manufacturers and suppliers for various materials and sizes of sputtering targets and arc cathodes. Our chromium sputtering target, with high purity, include monolithic or spayed rotatable (rotary, cylindrical) targets, planar (rectangle, disc) targets, and arc cathodes, which are extensiely used in pvd coating for thin film deposition technology. Welcome to buy and wholesale our low price, high usage rates, high purity and high quality chromium targets.Metal Sputtering Targets bonding
website:http://www.pvdtarget.com/metal-sputtering-targets/

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